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Formation of silicon nanocrystals with preferred (100) orientation in amorphous Si:H films grown on glass substrates and exposed to nanosecond pulses of ultraviolet radiation

✍ Scribed by M. D. Efremov; V. V. Bolotov; V. A. Volodin; S. A. Kochubei; A. V. Kretinin


Book ID
110129079
Publisher
Springer
Year
2002
Tongue
English
Weight
95 KB
Volume
36
Category
Article
ISSN
1063-7826

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