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Formation of silicon dioxide films in acidic solutions

✍ Scribed by Akihiro Hishinuma; Takuji Goda; Masaki Kitaoka; Shigeo Hayashi; Hideo Kawahara

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 365 KB
Volume: 48-49
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(91)90364-p

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