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Formation of oxynitride layers in a RF plasma planar reactor for future Si and SiC MOS structures

✍ Scribed by T. Bieniek; R. B. Beck; A. Jakubowski; P. Konarski; M. Cwil; P. Hoffmann; D. Schmeisser


Book ID
111502943
Publisher
Allerton Press, Inc.
Year
2007
Tongue
English
Weight
389 KB
Volume
29
Category
Article
ISSN
1063-4576

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