✦ LIBER ✦
Formation of nano-crystalline Si by thermal annealing of SiOx, SiCx and SiOyCx amorphous alloys: model systems for advanced device processing
✍ Scribed by D.M. Wolfe; G. Lucovsky
- Book ID
- 117984982
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 146 KB
- Volume
- 266-269
- Category
- Article
- ISSN
- 0022-3093
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