Formation of halogenated organic byproducts during medium-pressure UV and chlorine coexposure of model compounds, NOM and bromide

✍ Scribed by Quan Zhao; Chii Shang; Xiangru Zhang; Guoyu Ding; Xin Yang

• Book ID: 116973456
• Publisher: IWA Publishing
• Year: 2011
• Tongue: English
• Weight: 558 KB
• Volume: 45
• Category: Article
• ISSN: 0043-1354
• DOI: 10.1016/j.watres.2011.09.053