Formation of GeSi Alloy at or near the Surface of Si Wafers for the Si/Ge/Si System by the Electron-Beam Doping Method

✍ Scribed by Wada, T. ;Fujimoto, H. ;Sobue, S. ;Masuda, H.

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 603 KB
• Volume: 161
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/1521-396x(199705)161:1<133::aid-pssa133>3.0.co;2-e