✦ LIBER ✦

Formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by MOCVD –precursor versus substrate control

✍ Scribed by Christian Erich Zybill; Wei Huang

Book ID: 108331806
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 489 KB
Volume: 291
Category: Article
ISSN: 0020-1693
DOI: 10.1016/s0020-1693(99)00158-9

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Identification of [(OC)4FeSi(CH3)2·{(H3C

Identification of [(OC)4FeSi(CH3)2·{(H3C)2N}3PO] as Intermediate in the Formation of Polysilanes from (H3C)2SiCl2 and [Na2Fe(CO)4]

✍ Dr. Christian Zybill; Dr. Dallas L. Wilkinson; Christian Leis; Dr. Gerhard Mülle 📂 Article 📅 1989 🏛 John Wiley and Sons 🌐 English ⚖ 362 KB 👁 2 views