AFM and SNOM characterization of carboxy
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A. Cricenti; G. Longo; M. Luce; R. Generosi; P. Perfetti; D. Vobornik; G. Margar
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Article
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2003
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Elsevier Science
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English
β 341 KB
Silicon and silicon nitride surfaces have been successfully terminated with carboxylic acid monolayers and investigated by atomic force microscopy (AFM) and scanning near-field optical microscopy (SNOM). On clean Si surface, AFM showed topographical variations of 0.3-0.4 nm while for the clean Si 3