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Formation and growth of SnO[sub 2] nanoparticles in silica glass by Sn implantation and annealing

✍ Scribed by P. K. Kuiri; H. P. Lenka; J. Ghatak; G. Sahu; B. Joseph; D. P. Mahapatra

Book ID
121734599
Publisher
American Institute of Physics
Year
2007
Tongue
English
Weight
361 KB
Volume
102
Category
Article
ISSN
0021-8979

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Room-temperature Ti ion implantation and subsequent thermal annealing in N 2 ambience have been used to fabricate the anatase and rutile structured N-doped TiO 2 particles embedded in the surface region of fused silica. The Stopping and Range of Ions in Matter (SRIM) code simulation indicates a Gaus