Focused-ion-beam direct structuring of fused silica for fabrication of nano-imprinting templates

Simulation of ion beam direct structurin

Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

✍ E. Platzgummer; A. Biedermann; H. Langfischer; S. Eder-Kapl; M. Kuemmel; S. Cern 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 564 KB

A software tool (''Ionshaper TM '') has been developed which allows calibrated high precision simulation of ion beam processing. The continuum model is based on a discrete surface element approach that includes first and second-order sputtering and re-deposition in 2D. Atomistic effects are implicit