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FMR investigations of half-metallic ferromagnets

✍ Scribed by Rameev, B. ;Yildiz, F. ;Kazan, S. ;Aktas, B. ;Gupta, A. ;Tagirov, L. R. ;Rata, D. ;Buergler, D. ;Gruenberg, P. ;Schneider, C. M. ;Kämmerer, S. ;Reiss, G. ;Hütten, A.


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
290 KB
Volume
203
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

Thin films of various half‐metallic ferromagnets, such as chromium dioxide (CrO~2~) and Heusler alloys (Co~2~Cr~0.6~Fe~0.4~Al, Co~2~MnSi) have been investigated by ferromagnetic resonance (FMR) technique. It is demonstrated that FMR is a very efficient method to study the nanoscale magnetic properties, in particular to probe the magnetic anisotropy and magnetic inhomogeneities of ferromagnetic thin films. Epitaxial CrO~2~ thin films of various thicknesses (25–535 nm) have been deposited on TiO~2~(100) substrates by chemical vapor deposition process. It is shown that the magnetic behavior of the CrO~2~ films results from a competition between the magnetocrystalline and strain anisotropies. For the ultrathin CrO~2~ film (25 nm) the magnetic easy axis switches from the c‐direction to the b‐direction of the rutile structure. Thin‐film Co~2~Cr~0.6~Fe~0.4~Al samples (25 nm or 100 nm) have been grown by DC magnetron sputtering either on unbuffered SiO~2~(100) substrates or on the substrates capped by a 50 nm thick V buffer layer. The effects of the vanadium buffer layer and of the film thickness are revealed by FMR studies of the Co~2~Cr~0.6~Fe~0.4~Al samples. Well‐resolved multiple spin‐wave modes are observed in the unbuffered Co~2~Cr~0.6~Fe~0.4~Al sample with a thickness of 100 nm and the exchange stiffness constant has been estimated. Thin films of Co~2~MnSi (4–100 nm) have been grown by DC sputtering on silicon substrates on top of a 42 nm thick V seed layer and capped either by Al~2~O~3~ or by Co and V layers. A set of the 80 nm thick films has been annealed at different temperatures in the range of 425–550 °C. FMR studies of the Co~2~MnSi samples shows that at the fixed annealing temperature (450 °C) the highest magnetization is observed in the sample with a thickness of 61 nm, while the thicker samples (100 nm) reveal not only a lower magnetization but greater magnetic inhomogeneity as well. An annealing treatment at T ≥ 450 °C is essential to obtain higher magnetization as well as uniform magnetic properties in the Co~2~MnSi films. Weak SWR modes have also been observed in the thick Heusler films. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


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