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Fluorine passivation of metal surface for self-cleaning semiconductor equipment : N. Miki, M. Maeno, K. Maruhashi, Y. Nakagawa and T. Ohmi. IEEE Trans. Semiconductor Mfg3(1), 1 (1990)


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
136 KB
Volume
30
Category
Article
ISSN
0026-2714

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