Correlation Between the Electrical Prope
β
F. Fabreguette; L. Imhoff; M. Maglione; B. Domenichini; M. C. Marco de Lucas; P.
π
Article
π
2000
π
John Wiley and Sons
π
English
β 616 KB
Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metalΒ±organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450 C to