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Flash IR drying of electrical porcelain at various pressures

✍ Scribed by E. Kolbe; D. Tredup


Publisher
Springer US
Year
1967
Tongue
English
Weight
223 KB
Volume
12
Category
Article
ISSN
1573-871X

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Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metalΒ±organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450 C to