Finite-Element Computation of Sensitivities of Interconnect Parasitic Capacitances to the Process Variation in VLSI

✍ Scribed by Qu, H.; Kong, L.; Xu, Y.; Xu, X.; Ren, Z.

• Book ID: 114652531
• Publisher: IEEE
• Year: 2008
• Tongue: English
• Weight: 192 KB
• Volume: 44
• Category: Article
• ISSN: 0018-9464
• DOI: 10.1109/tmag.2007.916411