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Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics

✍ Scribed by A. A. Orlikovsky; K. V. Rudenko; S. N. Averkin


Book ID
110164504
Publisher
SP MAIK Nauka/Interperiodica
Year
2006
Tongue
English
Weight
363 KB
Volume
40
Category
Article
ISSN
0018-1439

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