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Field emission photocathode array for multibeam electron lithography

✍ Scribed by M.J. Wieland; B.J. Kampherbeek; P. Addessi; P. Kruit

Book ID
114155310
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
516 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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## Abstract Nano‐crystalline AlN:Si cold cathodes were grown by molecular beam epitaxy on prefabricated silicon __ΞΌ__ ‐tip field emission arrays (FEAs). The investigated FEAs showed an uniform tip distribution and reproducible emission properties. Current densities of up to 0.7 mA for a 4 Γ— 10^6^ t