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Field emission enhancement of carbon nitride films by annealing with different durations

✍ Scribed by J.J. Li; C.Z. Gu; P. Xu; Q. Wang; W.T. Zheng


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
383 KB
Volume
126
Category
Article
ISSN
0921-5107

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In a series of two papers we describe the effect of argon dilution of the nitrogen passed through the RF discharge region on the plasma composition, growth rate and some characteristics of silicon nitride films deposited by remove PECVD. In this part we report the results of an emission spectroscopi