Ferroelectric Thin Films: Basic Properties and Device Physics for Memory Applications

✍ Scribed by Yoshihiro Ishibashi (auth.), Masanori Professor Okuyama, Yoshihiro Ishibashi (eds.)

Publisher: Springer-Verlag Berlin Heidelberg
Year: 2005
Tongue: English
Leaves: 263
Series: Topics in Applied Physics 98
Edition: 1
Category: Library

No coin nor oath required. For personal study only.

✦ Synopsis

Ferroelectric thin films continue to attract much attention due to their developing, diverse applications in memory devices, FeRAM, infrared sensors, piezoelectric sensors and actuators. This book, aimed at students, researchers and developers, gives detailed information about the basic properties of these materials and the associated device physics. All authors are acknowledged experts in the field.

✦ Table of Contents

Theoretical Aspects of Phase Transitions in Ferroelectric Thin Films....Pages 3-23
Chemical Solution Depositionof Layer-Structured Ferroelectric Thin Films....Pages 25-59
Pb-Based Ferroelectric Thin Films Prepared by MOCVD....Pages 59-77
Spontaneous Polarization and Crystal Orientation Control of MOCVD PZT and Bi 4 Ti 3 O 12 -Based Films....Pages 77-91
Rhombohedral PZT Thin Films Prepared by Sputtering....Pages 91-105
Scanning Nonlinear Dielectric Microscopy....Pages 105-126
Analysis of Ferroelectricity and Enhanced Piezoelectricity near the Morphotropic Phase Boundary....Pages 127-148
Correlation Between Domain Structures and Dielectric Properties in Single Crystals of Ferroelectric Solid Solutions....Pages 147-162
Relaxor Superlattices: Artificial Control of the Ordered–Disordered State of B -Site Ions in Perovskites....Pages 161-175
Physics of Ferroelectric Interfaces: An Attempt at Nanoferroelectric Physics....Pages 177-199
Preparation and Properties of Ferroelectric–Insulator–Semiconductor Junctions Using YMnO 3 Thin Films....Pages 199-220
Improvement of Memory Retention in Metal–Ferroelectric–Insulator–Semiconductor (MFIS) Structures....Pages 219-241

✦ Subjects

Magnetism, Magnetic Materials; Crystallography; Electronics and Microelectronics, Instrumentation; Metallic Materials; Physics and Applied Physics in Engineering

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