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Femtosecond pulsed laser deposition of nanostructured TiO2 films

✍ Scribed by Mikel Sanz; Malgorzata Walczak; Rebeca de Nalda; Mohamed Oujja; José F. Marco; Javier Rodriguez; Jesús G. Izquierdo; Luis Bañares; Marta Castillejo


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
735 KB
Volume
255
Category
Article
ISSN
0169-4332

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In this work a frequency-doubled Nd:glass laser with a pulse duration of 250 fs has been used to ablate a TaC target and to deposit thin films on silicon. The results have been compared with those previously obtained by nanosecond pulsed laser deposition and evidence of large differences in the plas