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Femtosecond-laser-assisted wet chemical etching of polymer materials

✍ Scribed by C. Wochnowski; Y. Hanada; Y. Cheng; S. Metev; F. Vollertsen; K. Sugioka; K. Midorikawa

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
686 KB
Volume
100
Category
Article
ISSN
0021-8995

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✦ Synopsis

Abstract

Polymers are modified by femtosecond‐(fs)‐IR‐laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polymethylmethacrylate (PMMA), fluorinated PMMA, poly‐N‐methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs‐laser‐induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent (n‐hexane, benzene, and methylisobutylketone). The surface topography of the fs‐laser‐irradiated area is characterized by stylus‐profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs‐laser‐irradiated polymer region. The experimental results are relevant for the fabrication of three‐dimensional (3D)‐structures in the volume of a transparent polymer material by fs‐laser irradiation. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 100: 1229–1238, 2006

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