Feasibility of high-energy boron implantation for p-type retrograde well formation

High-dose oxygen implantation of multila

High-dose oxygen implantation of multilayered thin films for the formation of high-temperature superconductors: A feasibility study

✍ D.A. Lilienfeld; P. Børgesen 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 567 KB

A high-dose ion implantation technique for the formation of high-temperature superconducting thin films on silicon substrates is investigated. This technique consists of three steps: (1) deposition of a multilayer sample of the appropriate composition, (2) implantation of oxygen to mix the layers an