Fast photorefractive materials using quantum wells

✍ Scribed by N.T. Pelekanos; B. Deveaud; C. Guillemot; J.M. Gérard; P. Gravey; B. Lambert; A. Le Corre; J.E. Viallet

• Book ID: 103959944
• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 453 KB
• Volume: 4
• Category: Article
• ISSN: 0925-3467
• DOI: 10.1016/0925-3467(94)00085-9

✦ Synopsis

Photorefractive materials utilizing the large electro-optic coefficients of quantum wells are attractive for image processing applications due to the potentially fast response times (less than/zs). Recent results on photorefractive quantum wells indicate that lateral diffusion of trapped carriers is a serious limitation of the spatial resolution. In order to address this problem, we propose the incorporation on either side of a multiple quantum well section, of ultrathin layers of InAs islands serving as a dense layer of deep traps eliminating lateral diffusion. Furthermore, we propose a novel quantum heterostructure especially designed to be used as a thin film photorefractive device without the need of electrical contacts.

Advantages of quantum well over bulk photorefractives