Fast ion induced defects in silicon and semiconductor applications : A. Hallen, P. Hakansson and B. U. R. Sundqvist. Vacuum 39(2–4), 199 (1989)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 58 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90152-d