Fast and slow interface state distributions on (100) and (111) Si:SiO2 surfaces following negative bias stress

✍ Scribed by MJ Uren; JM Ostler; AM Hodge

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 336 KB
• Volume: 28
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(95)00005-s