Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography

Random Poly(methyl methacrylate-co-styre

Random Poly(methyl methacrylate-co-styrene) Brushes by ATRP to Create Neutral Surfaces for Block Copolymer Self-Assembly

✍ Hui Liu; Colm T. O'Mahony; Fabrice Audouin; Claudia Ventura; Michael Morris; And 📂 Article 📅 2011 🏛 John Wiley and Sons 🌐 English ⚖ 796 KB

## Abstract Random copolymer brushes of styrene and methyl methacrylate (MMA) on silicon wafers by atom transfer radical polymerization (ATRP) are synthesized using CuCl/CuCl~2~/HMTETA. It is found that with increasing amount of styrene the thickness of the brush layer could no longer be well contr