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Fabrication Process for Integrating Nanoparticles With Released Structures Using Photoresist Replacement of Sublimated p-Dichlorobenzene for Temporary Support

✍ Scribed by Hwang, Yongha; Candler, Rob N.


Book ID
118166310
Publisher
IEEE
Year
2012
Tongue
English
Weight
439 KB
Volume
21
Category
Article
ISSN
1057-7157

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