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Fabrication parameters and NO2 sensitivity of reactively RF-sputtered In2O3 thin films

✍ Scribed by H Steffes; C Imawan; F Solzbacher; E Obermeier


Book ID
108469216
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
614 KB
Volume
68
Category
Article
ISSN
0925-4005

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