Fabrication of sub-micrometer PMOSFETs with sub-100 nm p+-n shallow junctions using group III dual ion implantation

✍ Scribed by C.-M. Lin; A.J. Steckl

• Book ID: 103391337
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 283 KB
• Volume: 33
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(90)90054-i