Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal–Organic Materials

✍ Scribed by Mihaela Nedelcu; Mohammad S. M. Saifullah; David G. Hasko; Arang Jang; David Anderson; Wilhelm T. S. Huck; Geraint A. C. Jones; Mark E. Welland; Dae Joon Kang; Ullrich Steiner

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 407 KB
• Volume: 20
• Category: Article
• ISSN: 1616-301X
• DOI: 10.1002/adfm.201000219