Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering

Reflective properties of Mo/Si multilaye

Reflective properties of Mo/Si multilayer for EUV lithography deposited by the magnetron sputtering device with superconducting bulk magnets

✍ T. Yamaguchi; H. Ikuta; T. Tomofuji; Y. Yanagi; Y. Itoh; T. Oka; U. Mizutani 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 417 KB

We have fabricated Mo/Si bi-layer and multilayer films under the Xe gas pressures in the range of 0.005-0.1 Pa and the throw distance between the substrate and target longer than 200 mm by using the twocathode superconducting magnetron sputtering apparatus and studied the effect of deposition condit