Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

✍ Scribed by S. Gorelick; N. Puttaraksa; T. Sajavaara; M. Laitinen; S. Singkarat; H.J. Whitlow

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 767 KB
• Volume: 266
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2008.03.035