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Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

✍ Scribed by Yu, Zhaoning; Gao, He; Wu, Wei; Ge, Haixiong; Chou, Stephen Y.

Book ID: 121841112
Publisher: AVS (American Vacuum Society)
Year: 2003
Tongue: English
Weight: 551 KB
Volume: 21
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.1619958

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