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Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

✍ Scribed by Salaun, Mathieu; Zelsmann, Marc; Archambault, Sophie; Borah, Dipu; Kehagias, Nikolaos; Simao, Claudia; Lorret, Olivier; Shaw, Matthew T.; Sotomayor Torres, Clivia M.; Morris, Mickael A.


Book ID
120590879
Publisher
The Royal Society of Chemistry
Year
2013
Tongue
English
Weight
886 KB
Volume
1
Category
Article
ISSN
2050-7526

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