✦ LIBER ✦
Fabrication of HfO2patterns by laser interference nanolithography and selective dry etching for III-V CMOS application
✍ Scribed by Marcos Benedicto; Beatriz Galiana; Jon M Molina-Aldareguia; Scott Monaghan; Paul K Hurley; Karim Cherkaoui; Luis Vazquez; Paloma Tejedor
- Book ID
- 115021113
- Publisher
- Springer-Verlag
- Year
- 2011
- Tongue
- English
- Weight
- 940 KB
- Volume
- 6
- Category
- Article
- ISSN
- 1931-7573
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