Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
✍ Scribed by K. Yamamura; K. Ueda; M. Nagano; N. Zettsu; S. Maeo; S. Shimada; T. Utaka; K. Taniguchi
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 392 KB
- Volume
- 616
- Category
- Article
- ISSN
- 0168-9002
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✦ Synopsis
A doubly curved crystal spectrometer with Johansson-type geometry is very effective for focusing and monochromatizing an X-ray beam. In this study, numerically controlled local wet etching (NC-LWE) was used to form the curvature of the Si(1 1 1) substrate. NC-LWE figuring reduced the inclination of the crystal plane to less than 0.011 by applying the controlled etching of the surface, and achieved error of the figured curvature radius R of 6.7%. The reflectivity and the full width at half maximum (FWHM) of the rocking curve of the processed surface were almost the same as those of the unprocessed surface.