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Fabrication of Cu(Ti) Alloy Interconnects with Self-Formation of Thin Barrier Metal Layers Using a High-Pressure Annealing Process

✍ Scribed by S. Tsukimoto; T. Onishi; K. Ito; M. Konno; T. Yaguchi; T. Kamino; M. Murakami


Publisher
Springer US
Year
2007
Tongue
English
Weight
277 KB
Volume
36
Category
Article
ISSN
0361-5235

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