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Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition

โœ Scribed by Wu, J.; Eastman, M.; Gutu, T.; Wyse, M.; Jiao, J.; Kim, S.-M.; Mann, M.; Zhang, Y.; Teo, K. B. K.


Book ID
111943266
Publisher
American Institute of Physics
Year
2007
Tongue
English
Weight
617 KB
Volume
91
Category
Article
ISSN
0003-6951

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## ลฝ . ลฝ . A combination of ion beam assisted deposition IBAD and plasma enhanced chemical vapor deposition PECVD was used to deposit ลฝ . ลฝ . tetrahedral amorphous carbon layers, known as amorphic diamond a-d , onto 304 stainless steel and tungsten carbide WC substrates. ลฝ . The so-obtained thin