Fabrication of aluminum oxide films with high deposition rates using the activated reactive evaporation technique

✍ Scribed by J.S. Yoon; G.F. Potwin; H.J. Doerr; C.V. Deshpanday; R.F. Bunshah

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 502 KB
• Volume: 43-44
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/0257-8972(90)90075-n