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Fabrication of 15 μm thick Si-hole masks for demagnifying projection systems for ion- or electron-beams

✍ Scribed by J. Olschimke; I.W. Rangelow; T. Tschudi; R. Kassing


Book ID
103597969
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
535 KB
Volume
6
Category
Article
ISSN
0167-9317

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