Effects of Ar and O2 additives on photop
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B. Kolodziejczyk; A.R. Ellingboe; S. Daniels; L. Oksuz; M. Oubaha; H. Barry; R.
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Article
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2010
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Elsevier Science
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English
⚖ 571 KB
We present a novel study of the interaction of SF 6 -based plasmas with sol-gel materials in a parallel plate reactive ion etching (RIE) system. The purpose of these experiments was to obtain quantitative measures and optimisation of the RIE parameters, which can be used in the microfabrication of p