Evaluation of trap states at front and b
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Mutsumi Kimura
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Article
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2005
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John Wiley and Sons
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English
β 756 KB
## Abstract The trap states at the front and back oxide interfaces and grain boundaries of polycrystalline silicon thinβfilm transistors are evaluated by using electrical characteristic analysis and device simulation. First, the method for extracting the trap densities of the front and back oxide i