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Fabrication and electrical characteristics of ultrathin (HfO2)x(SiO2)1−x films by surface sol–gel method and reaction-anneal treatment

✍ Scribed by You-Pin Gong; Ai-Dong Li; Chao Zhao; Yi-Dong Xia; Di Wu


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
347 KB
Volume
87
Category
Article
ISSN
0167-9317

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