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Fabrication and Characterization of Pd/TiO2/Si MIS Structure with TiO2 Film as Insulator Layer Deposited by Low Temperature Arc Vapor Deposition Process

✍ Scribed by Shubham, Kumar; Khan, R. U.; Chakrabarti, P.

Book ID: 121809424
Publisher: American Scientific Publishers
Year: 2013
Weight: 596 KB
Volume: 1
Category: Article
ISSN: 2330-0760
DOI: 10.1166/asfo.2013.1009

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