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Fabrication and characterisation of high resistivity SOI substrates for monolithic high energy physics detectors

✍ Scribed by F.H. Ruddell; S.L. Suder; M.F. Bain; J.H. Montgomery; B.M. Armstrong; H.S. Gamble; D. Denvir; G. Casse; T. Bowcock; P.P. Allport; J. Marczewski; K. Kucharski; D. Tomaszewski; H. Niemiec; W. Kucewicz


Book ID
108271694
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
289 KB
Volume
52
Category
Article
ISSN
0038-1101

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3D processing on 6 in. high resisti
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An insight is given into the state-of-the-art 3D processing on 6 in. (150 mm) high resistivity siliconon-insulator (SOI) wafers. The edgeless detector design offers some attractive properties for high-energy physics experiments and medical imaging studies, such as seamless tileability of the detecto