Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks

✍ Scribed by F. Bijkerk; L.A. Shmaenok; E. Louis; H.J. Voorma; N.B. Koster; C. Bruineman; R.K.F.J. Bastiaensen; E.W.J.M. van der Drift; J. Romijn; L.E.M. de Groot; B.A.C. Rousseeuw; T. Zijlstra; Yu.Ya. Platonov; N.N. Salashchenko

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 303 KB
• Volume: 30
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(95)00222-7