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Extraction of SiO2/SiC interface trap profile in 4H- and 6H-SiC metal-oxide semiconductor field-effect transistors from subthreshold characteristics at 25°C and 150°C

✍ Scribed by Yanqing Deng; Wei Wang; Qizhi Fang; Mahalingam B. Koushik; T. Paul Chow


Book ID
107453619
Publisher
Springer US
Year
2006
Tongue
English
Weight
147 KB
Volume
35
Category
Article
ISSN
0361-5235

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