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Extraction of lateral device parameters and channel doping profile of vertical double-diffused MOS transistors

✍ Scribed by Jongoh Kim; Byounguk Ihn; Bumman Kim; Kwangil Lee; Wonoh Lee; Seounghwan Lee


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
395 KB
Volume
39
Category
Article
ISSN
0038-1101

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