Extended-type defects created by high temperature helium implantation into silicon

✍ Scribed by M.F. Beaufort; S.E. Donnelly; S. Rousselet; M.L. David; J.F. Barbot

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 170 KB
• Volume: 242
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.08.145