✦ LIBER ✦
Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing
✍ Scribed by Jeong, Young-Seon; Kim, Byungwhan; Ko, Young-Don
- Book ID
- 120360823
- Publisher
- Elsevier Science
- Year
- 2013
- Tongue
- English
- Weight
- 819 KB
- Volume
- 40
- Category
- Article
- ISSN
- 0957-4174
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