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Experimental study of the process of film condensation of nitrogen vapor from a mixture with helium

✍ Scribed by V. K. Orlov; A. I. Smorodin; L. D. Marchenko

Publisher
Springer US
Year
1977
Tongue
English
Weight
420 KB
Volume
32
Category
Article
ISSN
1573-871X

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Films were produced by plasma enhanced chemical vapor deposition (PECVD) of tetramethylsilane (TMS) -helium-argon mixtures with either oxygen or nitrogen in a vacuum system fed with radiofrequency power. Actinometric optical emission spectroscopy was used to determine trends in the concentrations of